EFFECT OF MODULATION ON THE PLASMA DEPOSITIONOF HYDROGENATED AND FLUORINATED SILICON NITRIDE
- Author(s):
- Publication title:
- Plasma-surface interactions and processing of materials
- Title of ser.:
- NATO ASI series. Series E, Applied sciences
- Ser. no.:
- 176
- Pub. Year:
- 1990
- Page(from):
- 171
- Page(to):
- 173
- Pages:
- 3
- Pub. info.:
- Dordrecht: Kluwer Academic Publishers
- ISSN:
- 0168132X
- ISBN:
- 9780792305842 [0792305841]
- Language:
- English
- Call no.:
- N11482/176
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
Materials Research Society |
Materials Research Society |
Kluwer Academic Publishers |
Materials Research Society |
kluwer Academic Publishers |
4
Conference Proceedings
STUDY OF SiF4N2-H2 PLASMAS FOR THE DEPOSITION OF FLUORINATED SILICON NITRIDE FILMS
Materials Research Society |
American Chemical Society |
5
Conference Proceedings
EFFECT OF PLASMA MODULATION IN THE GLOW DISCHARGE DEPOSITION OF AMORPHOUS SILICON FILMS
Materials Research Society |
Electrochemical Society |
Electrochemical Society |
12
Conference Proceedings
DEPOSITION CHEMISTRY AND STRUCTURE OF AMORPHOUS FLUORINATED SILICON NITRIDE
Materials Research Society |