Radiation Chemistry of Phenolic Resin Containing Epoxy and Azide Compounds
- Author(s):
- Publication title:
- Materials for microlithography : radiation-sensitive polymers
- Title of ser.:
- ACS symposium series
- Ser. no.:
- 266
- Pub. Year:
- 1984
- Page(from):
- 423
- Pub. info.:
- Washington, D.C.: American Chemical Society
- ISSN:
- 00976156
- ISBN:
- 9780841208711 [0841208719]
- Language:
- English
- Call no.:
- A05800/266
- Type:
- Conference Proceedings
Similar Items:
American Chemical Society |
Society of Plastics Engineers, Inc. (SPE) |
2
Conference Proceedings
A Silicon-Containing Positive Photoresist Developable with Aqueous Alkaline Solution
American Chemical Society |
Society of Plastics Engineers, Inc. (SPE) |
American Chemical Society |
9
Conference Proceedings
Negative resists for electron-beam lithography utilizing acid-catalyzed intramolecular dehydration of phenylcarbinol
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Evaluation of Water-Soluble Diazonium Salts as Contrast-Enhancement Materials Using a g-Line Stepper
American Chemical Society |
Trans Tech Publications |
5
Conference Proceedings
Development of Underfilling Encapsulant Based on Ternary Systems of Benzoxazine, Epoxy, and Phenolic Resins
Society of Plastics Engineers, Inc. (SPE) |
11
Conference Proceedings
Contrast-boosted resist using a polarity-change reaction during aqueous base development
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Surface and line-edge roughness in acid-breakable resin-based positive resist
SPIE-The International Society for Optical Engineering |
American Chemical Society |