Polymers of α-Substituted Benzyl Methacrylates and Aliphatic Aldehydes as New Types of Electron-Beam Resists
- Author(s):
Hatada, K. Kitayama, T. Okamoto, Y. Yuki, H. Aritome, H. Namba, S. Nate, K. Inoue, T. Yokono, H. - Publication title:
- Materials for microlithography : radiation-sensitive polymers
- Title of ser.:
- ACS symposium series
- Ser. no.:
- 266
- Pub. Year:
- 1984
- Page(from):
- 399
- Pub. info.:
- Washington, D.C.: American Chemical Society
- ISSN:
- 00976156
- ISBN:
- 9780841208711 [0841208719]
- Language:
- English
- Call no.:
- A05800/266
- Type:
- Conference Proceedings
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