Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers

Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers

Author(s):

Miller, R. D.

Publication title:

Materials for microlithography : radiation-sensitive polymers

Title of ser.:

ACS symposium series

Ser. no.:

266

Pub. Year:

1984

Page(from):

293

Pub. info.:

Washington, D.C.: American Chemical Society

ISSN:

00976156

ISBN:

9780841208711 [0841208719]

Language:

English

Call no.:

A05800/266

Type:

Conference Proceedings

Details

TDL ID:	ZA00020799
Series ID:	PA00000004
Conf. info. (Name):	Meeting of the American Chemical Society
Conf. info. (Number):	187th
Conf. info. (Venue):	St. Louis, MO, USA
Conf. info. (Date):	1984.04.08-1984.04.13

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