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A dual-function UHV-Compatible chamber for (i) low-temperature plasma-assisted oxidation, and (ii) high-temperature rapid thermal processing of Si-based dielelctric gate heterostructures

Author(s):
Hattangady, S.
Xu, X-L
Watkins, M. J.
Hornung, B.
Misra, V.
Lucovsky, G.
Wortman, J. J.
2 more
Publication title:
III-V electronic and photonic device fabrication and performance : symposium held April 12-15, 1993, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
300
Pub. Year:
1993
Page(from):
581
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558991965 [1558991964]
Language:
English
Call no.:
M23500/300
Type:
Conference Proceedings

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