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NUCLEATION AND GROWTH OF POLYCRYSTALLINE SILICON FILMS IN AN ULTRA HIGH VACUUM RAPID THERMAL CHEMICAL VAPOR DEPOSITION REACTOR USING DISILANE AND HYDROGEN

Author(s):
Violette, Katherine E.
Ozturk, Mehmet
Harris, Gari
Sanganeria, Mahesh K.
Lee, Archie
Maher, Dennis M.
1 more
Publication title:
Polycrystalline thin films : structure, texture, properties, and applications : symposium held April 4-8, 1994, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
343
Pub. Year:
1994
Page(from):
673
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992436 [155899243X]
Language:
English
Call no.:
M23500/343
Type:
Conference Proceedings

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