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Effect of reticle bias on isofocal process performance at sub-half-micron resolution

Author(s):
Publication title:
Metrology, Inspection, and Process Control for Microlithography XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3050
Pub. Year:
1997
Page(from):
496
Page(to):
506
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424648 [0819424641]
Language:
English
Call no.:
P63600/3050
Type:
Conference Proceedings

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