Application of statistical metrology to reduce total uncertainty in the CD-SEM measurement of across-chip linewidth variation

Application of statistical metrology to reduce total uncertainty in the CD-SEM measurement of across-chip linewidth variation

Author(s):

Monahan,K.M. ( KLA Instruments Corp. )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3050

Pub. Year:

1997

Page(from):

54

Page(to):

67

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424648 [0819424641]

Language:

English

Call no.:

P63600/3050

Type:

Conference Proceedings

Details

TDL ID:	ZA00020766
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	1997 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.12

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