Critical length of disorder for the onset of localization in YBa2Cu3O6.9 films

Critical length of disorder for the onset of localization in YBa2Cu3O6.9 films

Author(s):

Gauzzi,A. ( Ecole Polytechnique Federale de Lausanne )
Jonsson,B.J.
Clerc-Dubois,A.
Pavuna,D.

Publication title:

Oxide superconductor physics and nano-engineering II : 30 January -2 February 1996, San Jose, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2697

Pub. Year:

1996

Page(from):

273

Page(to):

283

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420718 [0819420719]

Language:

English

Call no.:

P63600/2697

Type:

Conference Proceedings

Details

TDL ID:	ZA00020731
Series ID:	PA00000029
Conf. info. (Name):	Photonics West : Oxide Superconductor Physics and Nano-Engineering
Conf. info. (Number):	1996 : 2nd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	1996.01.30-1996.02.02

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