Optical characterization of surface effects from Cu-contaminated SiO2/Si interfaces
- Author(s):
- Wang,X. ( Univ.of Arizona )
- Parks,H.G.
- Cariss,C.
- Lowell,J.K.
- Publication title:
- Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2638
- Pub. Year:
- 1995
- Page(from):
- 246
- Page(to):
- 255
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420046 [0819420042]
- Language:
- English
- Call no.:
- P63600/2638
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
7
Conference Proceedings
EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING
MRS - Materials Research Society |
Materials Research Society |
8
Conference Proceedings
White Light Emitting Diodes of GaN-Based Sr2SiO4:Eu and the Luminescent Properties
Trans Tech Publications |
Materials Research Society |
9
Conference Proceedings
Ultrathin Oxide Reliability: Effects of Gate Doping Concentration and Poly- Si/SiO2 Interface Stress Relaxation
Electrochemical Society |
Materials Research Society |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Room and Elevated Temperature Mechanical Properties of Hot-Pressed Uni-Cf/SiO2 Composite
Trans Tech Publications |
Trans Tech Publications |
6
Conference Proceedings
An Optical Approach to Evaluating the Effects of Chlorine on the Quality of Si/SiO2 Interfaces
MRS - Materials Research Society |
Trans Tech Publications |