Investigation of metal contamination by photocurrent measurements:validation and application to ion implantation processes

Investigation of metal contamination by photocurrent measurements:validation and application to ion implantation processes

Author(s):

Polignano,M.L. ( SGS-Thomson Microelectronics,Inc. )
Bresolin,C.
Cazzaniga,F.
Sabbadini,A.
Queirolo,G.

Publication title:

Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2638

Pub. Year:

1995

Page(from):

14

Page(to):

26

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420046 [0819420042]

Language:

English

Call no.:

P63600/2638

Type:

Conference Proceedings

Details

TDL ID:	ZA00020725
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microelectronic Manufacturing : Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing
Conf. info. (Number):	1995 : 2nd
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1995.10.25-1995.10.26

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