Epitaxial lateral overgrowth of GaN by the sublimation method and by MOCVD
- Author(s):
Wang,J. ( Univ.of Tokushima (Japan) ) Tottori,S. ( Univ.of Tokushima (Japan) ) Hao,M.S. ( Univ.of Tokushima (Japan) ) Sato,H. ( Univ.of Tokushima (Japan) ) Sakai,S. ( Univ.of Tokushima (Japan) ) Osinski,M. ( Univ.of Tokushima (Japan) ) - Publication title:
- Optoelectronic Materials and Devices
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3419
- Pub. Year:
- 1998
- Page(from):
- 7
- Page(to):
- 15
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819428738 [0819428736]
- Language:
- English
- Call no.:
- P63600/3419
- Type:
- Conference Proceedings
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