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Epitaxial lateral overgrowth of GaN by the sublimation method and by MOCVD

Author(s):
Wang,J. ( Univ.of Tokushima (Japan) )
Tottori,S. ( Univ.of Tokushima (Japan) )
Hao,M.S. ( Univ.of Tokushima (Japan) )
Sato,H. ( Univ.of Tokushima (Japan) )
Sakai,S. ( Univ.of Tokushima (Japan) )
Osinski,M. ( Univ.of Tokushima (Japan) )
1 more
Publication title:
Optoelectronic Materials and Devices
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3419
Pub. Year:
1998
Page(from):
7
Page(to):
15
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428738 [0819428736]
Language:
English
Call no.:
P63600/3419
Type:
Conference Proceedings

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