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Resolving localized oxide breakthrough during poly etch of nonvolatile floating gate structures

Author(s):
Publication title:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3507
Pub. Year:
1998
Page(from):
312
Page(to):
320
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429667 [081942966X]
Language:
English
Call no.:
P63600/3507
Type:
Conference Proceedings

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