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Flat-type metal residue-induced metal line bridge

Author(s):
  • Hsiao,H.C. ( Taiwan Semiconductor Manufacturing Co. )
  • Chu,P.T. ( Taiwan Semiconductor Manufacturing Co. )
  • Hsu,V.M. ( Taiwan Semiconductor Manufacturing Co. )
  • Chen,C.H. ( Taiwan Semiconductor Manufacturing Co. )
Publication title:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3507
Pub. Year:
1998
Page(from):
146
Page(to):
152
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429667 [081942966X]
Language:
English
Call no.:
P63600/3507
Type:
Conference Proceedings

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