Deposition and characterization of in situ boron doped polycrystalline silicon films for microelectromechanical systems applications

Deposition and characterization of in situ boron doped polycrystalline silicon films for microelectromechanical systems applications

Author(s):

Publication title:

Materials science of microelectromechanical systems (MEMS) devices II : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

605

Pub. Year:

2000

Page(from):

31

Pub. info.:

Warrendale, Pa.: MRS-Materials Research Society

ISSN:

02729172

ISBN:

9781558995130 [1558995137]

Language:

English

Call no.:

M23500/605

Type:

Conference Proceedings

Details

TDL ID:	ZA00020366
Series ID:	PA00000011
Conf. info. (Name):	Materials Science of Microelectromechanical Systems (MEMS) Devices : Symposium
Conf. info. (Number):	2nd
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1999.11.29-1999.12.01

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