Phenolic Resin-Based Negative Electron-Beam Resists

Phenolic Resin-Based Negative Electron-Beam Resists

Author(s):

Shiraishi, H.

Publication title:

Polymers for high technology : electronics and photonics

Title of ser.:

ACS symposium series

Ser. no.:

346

Pub. Year:

1987

Page(from):

77

Pub. info.:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841214064 [0841214069]

Language:

English

Call no.:

A05800/346

Type:

Conference Proceedings

Details

TDL ID:	ZA00020336
Series ID:	PA00000004
Conf. info. (Name):	Meeting of the American Chemical Society
Conf. info. (Number):	192nd
Conf. info. (Venue):	Anaheim, CA, USA
Conf. info. (Date):	1986.09.07-1986.09.12

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