METALLORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) OF TITANIUM-BASED FERROELECTRIC THIN FILMS

METALLORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) OF TITANIUM-BASED FERROELECTRIC THIN FILMS

Author(s):

Publication title:

Ferroelectric thin films III : symposium held April 13-16, 1993, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

310

Pub. Year:

1992

Page(from):

241

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992061 [1558992065]

Language:

English

Call no.:

M23500/310

Type:

Conference Proceedings

Details

TDL ID:	ZA00020320
Series ID:	PA00000011
Conf. info. (Name):	Symposium on ferroelectric thin films
Conf. info. (Number):	3rd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1993.04.13-1993.04.16

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