Removal of Fluorine from a Si(100) Surface by a Remote rf hydrogen Plasma

Removal of Fluorine from a Si(100) Surface by a Remote rf hydrogen Plasma

Author(s):

Publication title:

Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

386

Pub. Year:

1995

Page(from):

357

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992894 [1558992898]

Language:

English

Call no.:

M23500/386

Type:

Conference Proceedings

Details

TDL ID:	ZA00020319
Series ID:	PA00000011
Conf. info. (Name):	Symposium on ultraclean semiconductor processing technology and surface chemical cleaning and passivation
Conf. info. (Number):	1995
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1995.04.17-1995.04.19

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