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RIE Passivation Layer Removal by Remote H-Plasma and H2/SiH4 Plasma Processing

Author(s):
Publication title:
Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
386
Pub. Year:
1995
Page(from):
285
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992894 [1558992898]
Language:
English
Call no.:
M23500/386
Type:
Conference Proceedings

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