Blank Cover Image

Low-Temperature Formation of SiO2 and High Dielectrics Constant Material for ULSI in the 21st Century

Author(s):
Ohmi, T.
Sekine, K.
Kaihara, R.
Saito, Y.
Shirai, Y.
Hirayama, M.
1 more
Publication title:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
567
Pub. Year:
1999
Page(from):
3
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
Language:
English
Call no.:
M23500/567
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Low-Temperature Formation of Gate-Grade Silicon Oxide Films Using High-Density Krypton Plasma

Saito, Y., Sekine, K., Hirayama, M., Ohmi, T.

Electrochemical Society
7 Conference Proceedings Medical Material Opportunities for the 21st Century

Woo, L., Ling, M. T. K., Ding, S. Y., Khare, A. R.

Society of Plastics Engineers, Inc. (SPE)
2 Conference Proceedings Low Temperature Thin Oxide Film Formation by Microwave Excitation High Density Plasma Direct Oxidation

Kaihara, R., Hirayama, M., Ohmi, T.

Electrochemical Society
8 Conference Proceedings Medical Material Opportunities for the 21st Century

Woo L., Ling K. T. M., Ding Y. S., Khare R. A.

Society of Plastics Engineers, Inc. (SPE)
3 Conference Proceedings High Integrity Direct Oxidation/Nitridation at Low Temperatures Using Radicals

Ohmi, T., Sugawa, S., Hirayama, M.

Electrochemical Society
9 Conference Proceedings Medical Material Opportunities of the 21st Century

Woo, L., Ling, M. T. K., Ding, S. Y., Khare, A. R.

Society of Plastics Engineers, Inc. (SPE)
4 Conference Proceedings Integration Issues for Low-Dielectric Constant Materials in Each Generation of ULSIs

Gomi, H., Kishimoto, K., Usami, T., Koyanagi, K-I., Yokoyama, T., Oda, N., Matsubara, Y.

MRS - Materials Research Society
10 Conference Proceedings High Integrity Direct Oxidation/Nitridation At Low Temperature Using Radicals*

Ohmi, Tadahiro, Sugawa, Shigetoshi, Hirayama, Masaki

Electrochemical Society
5 Conference Proceedings Integration Issues for Low-Dielectric Constant Materials in Each Generation of ULSIs

Gomi, H., Kishimoto, K., Koyanagi, K-I., Matsubara, Y., Oda, N., Usami, T., Yokoyama, T.

Materials Research Society
11 Conference Proceedings High-Density Plasma Etching of Low-Dielectric Constant Materials

Standaert, T. E. F. M., Matsuo, P. J., Allen, S. D., Oehrlein, G. S., Dalton, T. J., Lu, T.-M., Gutmann, R.

MRS - Materials Research Society
6 Conference Proceedings Highly Reliable Thin SiO2 Film formation Technology

Ohmi, T., Okada, Y., Yabune, T., Ohmi, K.

Electrochemical Society
12 Conference Proceedings RuO2 THIN FILMS AS BOTTOM ELECTRODES FOR HIGH DIELECTRIC CONSTANT MATERIALS

Yoshikawa, K., Kimura, T., Noshiro, H., Ohtani, S., Yamada, M., Furumura, Y.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12