Native Oxide Growth Behavior on Silicon Surface With Various Resistivity in Ultrapure Water and CuF2 Solution

Native Oxide Growth Behavior on Silicon Surface With Various Resistivity in Ultrapure Water and CuF2 Solution

Author(s):

Publication title:

Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

477

Pub. Year:

1997

Page(from):

427

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993815 [1558993819]

Language:

English

Call no.:

M23500/477

Type:

Conference Proceedings

Details

TDL ID:	ZA00020310
Series ID:	PA00000011
Conf. info. (Name):	Symposium on science and technology of semiconductor surface preparation
Conf. info. (Number):	1997
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1997.04.01-1997.04.03

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