Effects of Wafer Cleaning Reduction on Metals Removal and Ultrathin Gate Oxide Quality

Effects of Wafer Cleaning Reduction on Metals Removal and Ultrathin Gate Oxide Quality

Author(s):

Publication title:

Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

477

Pub. Year:

1997

Page(from):

233

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993815 [1558993819]

Language:

English

Call no.:

M23500/477

Type:

Conference Proceedings

Details

TDL ID:	ZA00020310
Series ID:	PA00000011
Conf. info. (Name):	Symposium on science and technology of semiconductor surface preparation
Conf. info. (Number):	1997
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1997.04.01-1997.04.03

Similar Items:

1 Conference Proceedings Ultrathin Silicon Oxynitride Gate Dielectrics Gusev, E.P., D'Emic, C.P., Zabel, T.H., Copel, M. Electrochemical Society	7 Conference Proceedings Processing and Characterization of RTCVD Silicon Nitride and Oxynitride Grown in a Single-Wafer RT Cluster Tool D'Emic, C.P., Gusev, E.P., Newbury, I., Kozlowski, P., Chan, K., Zabel, T., Varekamp, P. Electrochemical Society
2 Conference Proceedings A Selective Etching Process for Chemically Inert High-k Metal Oxides Saenger, Katherine L., Okorn-Schmidt, Harald F., D'Emic, Christopher P. Materials Research Society	8 Conference Proceedings An Ozone-Water-Last Cleaning Process and the Effects on Gate Oxide Quality Nelson, S.L., Campbell, S.A., Schwab, B.D. Electrochemical Society
3 Conference Proceedings NH4F PRE-CLEANING OF SILICON (100) FOR UHV-CVD EPITAXY Cohen, Susan L., Blum, Joseph, D’Emic, Christopher, Gilbert, Monica, Cardone, Frank, Stanis, Carol, Liehr, Michael Materials Research Society	9 Conference Proceedings Gate Oxide Cleans on Single Wafer Tool P. Garnier, T. Vessa, A.S. Larrea, B. Pernet, Y. Gomez Electrochemical Society
4 Conference Proceedings VAPOR HF ETCHING FOR LOW TEMPERATURE SILICON EPITAXY D’Emic, Christopher P., Blum, Joseph M., Cohen, Susan L., Baseman, Robert J., Gilbert, Monica, Cardone, Frank, Stanis, … Materials Research Society	10 Conference Proceedings PROPERTIES OF CHEMICAL OXIDES FROM PRE-GATE CLEAN PROCESSES AND THEIR ROLE IN THE ELECTRICAL THICKNESS OF THERMALLY GROWN ULTRATHIN GATE OXIDES Guan, J., Gale, G., Bersuker, G., Jeon, Y., Nguyen, B., Barnett, J., Jackson, M., Burkman, D., Peavey, P., Yokomizo, K., … Electrochemical Society
5 Conference Proceedings Material and Integration Issues for Rare Earth Silicides as Gate and Diffusion Contacts in Advanced CMOS Technologies C.P. D'Emic, K. Ohuchi, C. Murray, C. Lavoie, C. Scerbo Electrochemical Society	11 Conference Proceedings Silicides for 22nm and Beyond P.R. Besser, C. Lavoie, C. Murray, C.P. D'Emic, K. Ohuchi Electrochemical Society
6 Conference Proceedings CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY Mertens, P.W., Meuris, M., Schmidt, H.F., Verhaverbeke, S., Heyns, M.M., Carr, P., Graeff, D., Schnegg, A., Kubota, M., … Electrochemical Society	12 Conference Proceedings IN-SITU PROCESSING AND REACTIONS OF CO2 WITH YBa2Cu3O7-x Michael Greenlief, C., Bringley, Joseph F., Scott, Bruce A., Gates, Stephen M., Trail, Steven S., D'Emic, Christopher Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12