Minimization of Interfacial Microroughness for 13-60 ｢？Ultrathin Gate Oxides

Minimization of Interfacial Microroughness for 13-60 ｢？Ultrathin Gate Oxides

Author(s):

Sapjeta, J.

Publication title:

Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

477

Pub. Year:

1997

Page(from):

203

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993815 [1558993819]

Language:

English

Call no.:

M23500/477

Type:

Conference Proceedings

Details

TDL ID:	ZA00020310
Series ID:	PA00000011
Conf. info. (Name):	Symposium on science and technology of semiconductor surface preparation
Conf. info. (Number):	1997
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1997.04.01-1997.04.03

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