Hot Water Etching of Silicon Surfaces: New Insights of Mechanistic Understanding and Implications to Device Fabrication

Hot Water Etching of Silicon Surfaces: New Insights of Mechanistic Understanding and Implications to Device Fabrication

Author(s):

Rosamilia, J. M.

Publication title:

Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

477

Pub. Year:

1997

Page(from):

181

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993815 [1558993819]

Language:

English

Call no.:

M23500/477

Type:

Conference Proceedings

Details

TDL ID:	ZA00020310
Series ID:	PA00000011
Conf. info. (Name):	Symposium on science and technology of semiconductor surface preparation
Conf. info. (Number):	1997
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1997.04.01-1997.04.03

Similar Items:

1 Conference Proceedings EFFECT OF HOT WATER EXPOSURE ON BARE SILICON SURFACES IN MOS PROCESSING Eisenberg, J. H., Shive, S. F., Stevie, F., Higashi, G. S., Boone, T., Hanson, K., Sapjeta, J. B., DiBello, G. N., … MRS - Materials Research Society	7 Conference Proceedings Minimization of Interfacial Microroughness for 13-60 ｢？Ultrathin Gate Oxides Sapjeta, J., Boone, T., Rosamilia, J. M., Silverman, P. J., Sorsch, T. W., Timp, G., Weir, B. E. MRS - Materials Research Society
2 Conference Proceedings Si3N4 PARTICLE REMOVAL EFFICIENCY STUDIES Liu, J.Q., Lee, C., Rosamilia, J.M., Boone, T., Higashi, G.S. Electrochemical Society	8 Conference Proceedings 6 Cleaning Technology in Semiconductor Device Manufacturing: Approaches to Environmentally Responsible Processing Rosamillia, J.M., Boone, T., Higashi, G.S. Electrochemical Society
3 Conference Proceedings The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning Higashi, G.S., Chabal, Y.J., Raghavachari, K., Becker, R.S., Green, M.P., Hanson, K., Boone, T., Eisenberg, J.H., Shive, … Electrochemical Society	9 Conference Proceedings INFRARED SPECTROSCOPY OF Si (111) AND Si (100) SURFACES AFTER HF TREATMENT: HYDROGEN TERMINATION AND SURFACE MORPHOLOGY Chabal, Y.J., Higashi, G.S., Raghavachari, K. Materials Research Society
4 Conference Proceedings THE EFFECT OF DILUTE CLEANING AND RINSING CHEMISTRIES ON TRANSITION METAL REMOVAL AND Si SURFACE MICROROUGHNESS Chang, J.P., Sapjeta, J., Rosamilia, J.M., Boone, T., Eng, J., Jr., Opila, R.L., Brennan, S., Wiemer, C., Pianetta, P. Electrochemical Society	10 Conference Proceedings Si3N4 Particle Removal Efficiency Study Liu, Jane Qian, Lee, Carolyn, Rosamilia, Joseph M., Boone, Tom, Czitrom, Veronica, Higashi, Gregg S. MRS - Materials Research Society
5 Conference Proceedings AFM Characterization of Semiconductor Materials and Devices Hanson, K.J., Sapjeta, J., Higashi, G.S. Electrochemical Society	11 Conference Proceedings DETECTION OF PROCESS INDUCED DISLOCATIONS IN SILICON Benton, J.L., Higashi, G.S., Boone, T. Electrochemical Society
6 Conference Proceedings FIRST-PRINCIPLES STUDY OF THE ETCHING REACTIONS OF HF AND H2O WITH Si/SiO2 SURFACES Raghavachari, Krishnan, Higashi, G. S., Chabal, Y. J., Trucks, G. W. MRS - Materials Research Society	12 Conference Proceedings Metal contamination issues resulting from new Si processes Benton, J. L., Boone, T., Jacobson, D.C., Lin, Wen, Wilk, G.D., Krautter, H. W., Rosamilia, J.M., Rafferty, C.S. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12