Blank Cover Image

Chemical Mechanical Cleaning for Post-CMP Applications: Defects and Metals Results

Author(s):
Zhao, E. Y.
Emami, R.
Malik, I.
Mishra, K.
Krusell, W. C.
Larios, J. de
Hymes, D. J.
2 more
Publication title:
Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
477
Pub. Year:
1997
Page(from):
137
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993815 [1558993819]
Language:
English
Call no.:
M23500/477
Type:
Conference Proceedings

Similar Items:

Krusell, Wilbur C., Malik, Igor J., Mohr, Fred, Hymes, Diane J.

Electrochemical Society

Tamboli, D., Banerjee, G., Waddell, M., Listebarger, J., Arefeen, Q., Hymes, S.

Electrochemical Society

Malik, Igor J., Zhang, Jackie, Jensen, Alan J., Farber, Jeffrey J., Krusell, Wilbur C., Raghavan, Srini, Rajhunath, …

MRS - Materials Research Society

Huynh, C., Rutten, M., Cheek, R., Linde, H.

Electrochemical Society

Ravkin, M., Farber, J. J., Malik, I. J., Zhang, J., Jensen, A. J., Larios, J. M. de, Krusell, W. C.

MRS - Materials Research Society

9 Conference Proceedings Post W CMP Cleaning Without HF Cleans

Y. Kang, C. Yang, T. Kwon, J. Park, J. Jo

Electrochemical Society

4 Conference Proceedings Challenges of Post Cu CMP Cleaning (II)

Li, Hugh, Zao, Eugene, Jiang, Linda, Hymes, Diane, Larios, John de

Electrochemical Society

J. Park, T. Kim

Electrochemical Society

Mordo, D., Goswami, I., Malik, I. J., Mallon, T., Emami, R., Withers, B.

MRS - Materials Research Society

D. Peters, K. Bartosh, C. Tran, C. Watts

Electrochemical Society

6 Conference Proceedings Mechanisms of Post-CMP Cleaning

Liang, H., Estragnat, E., Lee, J., Bahten, K., McMullen, D.

Materials Research Society

Hong, Y.K., Eom, D.H., Lee, S.H., Park, J.G., Busnaina, A.A.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12