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Growth of Polycrystalline Silicon Films at Low Temperature by Plasma Enhanced Chemical Vapor Deposition

Author(s):
Publication title:
Polycrystalline thin films II : structure, properties, and applications : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
403
Pub. Year:
1996
Page(from):
345
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993068 [1558993061]
Language:
English
Call no.:
M23500/403
Type:
Conference Proceedings

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