Blank Cover Image

IN-SITU X-RAY DIFFRACTION AND RESISTIVITY ANALYSIS OF CoSi2 PHASE FORMATION WITH AND WITHOUT A Ti INTERLAYER AT RAPID THERMAL ANNEALING RATES

Author(s):
Cabral, C., Jr.
Clevenger, L. A.
Stephenson, G. B.
Brauer, S.
Morales, G.
Ludwig, K. F., Jr.
1 more
Publication title:
Applications of synchrotron radiation techniques to materials science II : symposium held November 27-December 2, 1994, Boston, Massachusetts, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
375
Pub. Year:
1995
Page(from):
253
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992771 [1558992774]
Language:
English
Call no.:
M23500/375
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings In Situ Analysis of the Formation of Thin TiSi2 (<50 nm) Contacts in Submicron CMOS Structures During Rapid Thermal Annealing

Clevenger, L. A., Cabral, C., Jr, Roy, R. A., Lavoie, C., Viswanathan, R., Saenger, K. L., Jordan-Sweet, J., Morales, …

MRS - Materials Research Society
7 Conference Proceedings In-situ Studies of Silicide Formation in Ti-Ta Bilayer Thin Films on Poly-Si

Ozcan, A.S., Ludwig K.F., Jr., Lavoie, C., Cabral, C., Jr., Harper, J.M.E.

Materials Research Society
2 Conference Proceedings In Situ X-ray Diffraction Analysis of TiSi2 Phase Formation From a Titanium-Molybdenum Bilayer

Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E., Roy, R. A., Saenger, K. L., Miles, G. L., Mann, R. W.

MRS - Materials Research Society
8 Conference Proceedings SILICIDE FORMATION IN Ti-Si AND Co-Si REACTIONS

Clevenger, L. A., Hong, Q. Z., Mann, R., Harper, J. M. E., Barmak, K., Cabral, C., Jr., Nobili, C., Ottaviani, G.

MRS - Materials Research Society
3 Conference Proceedings In-Situ Measurements During Rapid Thermal Annealing for Process Characterization

Colgan, E. G., Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E.

MRS - Materials Research Society
9 Conference Proceedings In Situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation

Lavoje, C., Purtell, R., Cola, C., Detavernier, C., Desjardins, P., Jordan-Sweet, J., Cabral, C., Jr., d'Heurle, F.M., …

Electrochemical Society
4 Conference Proceedings In-Situ Resistance Measurements During Rapid Thermal Annealing for Process Characterization

Colgan, E. G., Cabral, C., Jr., Clevenger, L. A., Harper, J. M. E.

MRS - Materials Research Society
10 Conference Proceedings Reduction of the C54-TiSi2 Phase Formation Temperature Using Metallic Impurities

Mann, R. W., Clevenger, L. A., Miles, G. L., Harper, J. M. E., Cabral, C., Jr, d'Heurle, F. M., Knotts, T. A., Rakowski, …

MRS - Materials Research Society
5 Conference Proceedings EFFECT OF AN INTERFACIAL Ti LAYER ON THE FORMATION OF CoSi2 ON Si

Barmak, K., Clevenger, L. A., Agnello, P. D., Ganin, E., Copel, M., Dehaven, P., Falta, J., d'Heurle, F. M., Cabral Jr., …

Materials Research Society
11 Conference Proceedings A Kinetic Study of the C49 to C54 Conversion in TiSi2 Using Electrical Resistivity Measurements on Single Sub-Micron Lines

Saenger, K. L., Cabral, C., Jr, Clevenger, L. A., Roy, R. A.

MRS - Materials Research Society
6 Conference Proceedings In Situ TEM Analysis of TiSi2 C49-C54 Transformations During Annealing

Gignac, L. M., Svilan, V., Clevenger, L. A., Cabral, C., Jr., Lavoie, C.

MRS - Materials Research Society
12 Conference Proceedings COMPRESSIVE STRESS INCREASE WITH REPEATED THERMAL CYCLING IN TANTALUM(OXYGEN) THIN FILMS

Cabral, C., Jr., Clevenger, L. A., Schad, R. G.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12