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RAPID THERMAL PROCESSING OF SHALLOW JUNCTIONS USING EPITAXIAL CoSi2 AS A DOPING SOURCE

Author(s):
Jones, E. C.
Ogawa, S.
Ameika, P.
Dass, M. L. A.
Fraser, D. B.
Chu, P.
Cheung, N. W.
2 more
Publication title:
Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
342
Pub. Year:
1994
Page(from):
339
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992429 [1558992421]
Language:
English
Call no.:
M23500/342
Type:
Conference Proceedings

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