ArF photoresist system using alicyclic polymer
- Author(s):
Park,J.-H. ( Korea Kumho Petrochemical Co.,Ltd. ) Kim,S.-J. Park,S.-Y. Lee,H. Jung,J.-C. Bok,C.-K. Baik,K.-H. - Publication title:
- Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3049
- Pub. Year:
- 1997
- Page(from):
- 485
- Page(to):
- 491
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424631 [0819424633]
- Language:
- English
- Call no.:
- P63600/3049
- Type:
- Conference Proceedings
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