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Design of a positive-tone water-soluble resist

Author(s):
Havard,J.M. ( Univ.of California/Berkeley )
Frechet,J.M.J.
Pasini,D.
Mar,B.
Yamada,S.
Medeiros,D.R.
Willson,C.G.
2 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
437
Page(to):
447
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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