PHS with inert blocking groups for DUV negative resist

PHS with inert blocking groups for DUV negative resist

Author(s):

Brunsvold,W.R. ( IBM Microelectronics Div. )

Publication title:

Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3049

Pub. Year:

1997

Page(from):

372

Page(to):

384

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424631 [0819424633]

Language:

English

Call no.:

P63600/3049

Type:

Conference Proceedings

Details

TDL ID:	ZA00020295
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1997 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.12

Similar Items:

1 Conference Proceedings 193-nm negative resist based on acid-catalyzed elimination of polar molecules Sooriyakumaran, R., Davis, B.W., Larson, C.E., Brock, P.J., DiPietro, R.A., Wallow, T.I., Connor, E.F., Sundberg, L.K., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Advanced negative resists using novel aminoplast crosslinkers Afzali,A., Gelorme,J.D., Kosbar,L.L., Neisser,M.O., Brunswold,W., Feild,C., Lawson,M., Varanasi,R. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes) Varanasi,P.R., Jordhamo,G.M., Lawson,M.C., Chen,K.-J., Brunsvold,W.R., Hughes,T., Keller,R., Khojasteh,M., Li,W., … SPIE - The International Society for Optical Engineering	8 Conference Proceedings High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities Khojasteh, M., Chen, K.R., Kwong, R.W., Lawson, M.C., Varanasi, P.R., Patel, K.S., Kobayashi, E. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Evolution of a 193-nm bilayer resist for manufacturing Kwong, R.W., Khojasteh, M., Lawson, P., Hughes, T., Varanasi, P.R., Brunsvold, B., Allen, R.D., Brock, P.J., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Important role of hydroxyethyl derivatives of poly(hydroxystyrene) in the development of advanced negative resists Varanasi, P. R., Patel, N. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Material design and development for aqueous base compatible high-performance deep UV negative-tone resists Varanasi, Pushkara Rao, Ito, Hiroshi, Brock, Phil, Breyta, Gregory, Brunsvold, William R., Katnani, Ahmad D. American Chemical Society	10 Conference Proceedings "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization" Kwong,R.W., Varanasi,P.R., Lawson,M.C., Hughes,T., Jordhamo,G.M., Khojasteh,M., Mahorowala,A.P., Sooriyakumaran,R., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform … Kajita,T., Nishimura,Y., Yamamoto,M., Ishii,H., Soyano,A., Kataoka,A., Slezak,M., Shimizu,M., Varanasi,P.R., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group J.T. Fahey, W.E. Conley, W.R. Brunsvold, D.C. Yang, W.M. Moreau Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance Patel, K.S., Lawson, M.C., Varanasi, P.R., Medeiros, D.R., Wallraff, G.M., Brock, P.J., DiPietro, R.A., Nishimura, Y., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings ArF resist for contact hole application Chen,K.-J.R., Lawaon,M.C., Hughes,T., Brunsvld,W.R., Varanasi,P.R., Keller,R., Jordhamo,G.M. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12