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Design and process of a new DUV ARCH3 resist

Author(s):
Bantu,N. ( Olin Microelectronic Materials )
Maxwell,B.
Medina,A.
Sarubbi,T.R.
Toukhy,M.A.
Schacht,H.
Falcigno,P.A.
Munzel,N.
Petschel,K.
Houlihan,F.M.
Nalamasu,O.
Timko,A.G.
7 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
324
Page(to):
337
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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