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Non-chemically amplified 248-nm resist materials

Author(s):
Willson,C.G. ( Univ.of Texas at Austin )
Yueh,W.
Leeson,M.J.
Steinhasler,T.
McAdams,C.L.
Dammel,R.R.
Sounik,J.R.
Aslam,M.
Vicari,R.
Sheehan,M.
5 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
226
Page(to):
237
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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