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Photoresist characterization for lithography simulation:IV.Processing effects on resist parameters

Author(s):
Henderson,C.L. ( Univ.of Texas at Austin )
Tsiartas,P.C.
Flanagin,L.W.
Pancholi,S.
Chowdhury,S.A.
Dombrowski,K.D.
Chinwalla,A.N.
Willson,C.G.
3 more
Publication title:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3049
Pub. Year:
1997
Page(from):
212
Page(to):
223
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
Language:
English
Call no.:
P63600/3049
Type:
Conference Proceedings

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