Time-dependent simulation of acid and product distributions in chemically amplified resist

Author(s):

Kamon,K. ( Association of Super-Advanced Electronics Technologies and Mitsubishi Electric Corp. )

Nakazawa,K.

Yamaguchi,A.

Matsuzawa,N.

Ohfuji,T.

Tagawa,S.

1 more

Publication title:

Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3049

Pub. Year:

1997

Page(from):

180

Page(to):

188

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424631 [0819424633]

Language:

English

Call no.:

P63600/3049

Type:

Conference Proceedings