Probing the environmental stability and bake latitudes of acetal vs.ketal protected polyvinylphenol DUV resist systems

Probing the environmental stability and bake latitudes of acetal vs.ketal protected polyvinylphenol DUV resist systems

Author(s):

Kumar,U. ( Shipley Co. )

Publication title:

Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3049

Pub. Year:

1997

Page(from):

135

Page(to):

145

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424631 [0819424633]

Language:

English

Call no.:

P63600/3049

Type:

Conference Proceedings

Details

TDL ID:	ZA00020295
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1997 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.12

Similar Items:

1 Conference Proceedings Chemistry of ketal resist system and its lithographic performance Huang, Wu-Song, Lee, Kim Y., Bantu, Rao, Kwong, Ranee, Katnani, Ahmad, Khojasteh, Mahmoud, Brunsvold, William, Holmes, … American Chemical Society	7 Conference Proceedings Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists Varanasi,P.R., Cornett,K.M., Katnani,A.D. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist:KRS Petrillo,K., Brancaccio,J., Huang,W.-S., Kwong,R.W., Katnani,A.D. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Development of DUV resist formulations with excellent performance on metal substrates Rajaratnam,M.M., Cameron,J.F., Georger,J.H., Kang,D., Prokopowicz,G., Sinta,R.F., Thackeray,J.W. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers Huang,W.-S., Sooriyakumaran,R., Kwong,R.W., Katnani,A.D. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Benzyloxypropene-protected PHS resist system for e-beam applications Huang, W. -S., Kwong, R. W., Moreau, W. M., Chace, M., Lee, K. Y., Hu, C. K., Angelopoulos, M. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Negative-tone resist system using vinyl cyclic acetal crosslinker Huang,W.-S., Lee,K.Y., Chen,R.K.-J., Schepis,D. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Multiple-nonvolatile acetal (MANA) resists Guevremont,J.M., Brainard,R.L., Reeves,S.D., Zhou,X., Nguyen,T.B., Mackevich,J.F., Anderson,E.H., Taylor,G.N. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Overview of photoacid generator design for acetal resist systems Houlihan,F.M., Nalamasu,O., Reichmanis,E., Timko,A.G., Varlemann,U., Wallow,T.I., Bantu,N., Biafore,J., Sarubbi,T.R., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Deconstructing the resist to probe innate material roughness [6153-42] Fedynyshyn, T. H., Sinta, R. F., Astolfi, D. K., Cabral, A., Roberts, J., Meagley, R. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Process optimization of a positive-tone chemically amplified resist for 0.25-µm lithography using a vector scan e-beam tool A.D. Katnani, D. Schepis, R.W. Kwong, W. Huang, Z.C.H. Tan Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Polymeric base additives for lithographic improvement in DUV resist system Huang, W. -S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12