Resistance of Ni nanowires fabricated by STM-CVD

Resistance of Ni nanowires fabricated by STM-CVD

Author(s):

Wang,X.-D. ( Univ.of Texas/Austin )
Rubel,S.E.
Purbach,U.
Lozanne,A.L.de

Publication title:

Micromachining and Imaging

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3009

Pub. Year:

1997

Page(from):

2

Page(to):

6

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424204 [081942420X]

Language:

English

Call no.:

P63600/3009

Type:

Conference Proceedings

Details

TDL ID:	ZA00020291
Series ID:	PA00000029
Conf. info. (Name):	Photonics West : Micromachining and Imaging
Conf. info. (Number):	1997
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	1997.02.13

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