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Improved resolution in field-emission lithography machines

Author(s):
Chisholm,T. ( Leica Lithography Systems Ltd. )
Wallman,B.A.
Liu,H.
Munro,E.
Rouse,J.
Zhu,X.
1 more
Publication title:
Charged-particle optics II : 5 August, 1996, Denver, Colorado
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2858
Pub. Year:
1996
Page(from):
146
Page(to):
155
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422460 [0819422460]
Language:
English
Call no.:
P63600/2858
Type:
Conference Proceedings

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