Method for measuring absorbed energy density in photoresist in a laser pattern generation

Method for measuring absorbed energy density in photoresist in a laser pattern generation

Author(s):: Babin,S.V. ( Univ.Erlangen-Nurnberg )
Publication title:: Optical Microlithography IX
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 2726
Pub. Year:: 1996
Vol.:: Part2
Page(from):: 859
Page(to):: 865
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819421029 [0819421022]
Language:: English
Call no.:: P63600/2726
Type:: Conference Proceedings

Details

TDL ID:	ZA00020263
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1996 : 9th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1996.03.13-1996.03.15

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