Material limitations to 193-nm lithographic system lifetimes
- Author(s):
- Schenker,R.E. ( Univ.of California/Berkeley )
- Piao,F.
- Oldham,W.G.
- Publication title:
- Optical Microlithography IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2726
- Pub. Year:
- 1996
- Vol.:
- Part2
- Page(from):
- 698
- Page(to):
- 706
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- Language:
- English
- Call no.:
- P63600/2726
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
"IBM 193-nm bilayer resist: materials, lithographic performance, and optimization"
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Marathon testing of optical materials for 193-nm lithographic applications
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
"193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform …
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |