Improvement of resist pattern fidelity with partial attenuated phase-shift mask

Improvement of resist pattern fidelity with partial attenuated phase-shift mask

Author(s):

Publication title:

Optical Microlithography IX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

2726

Pub. Year:

1996

Vol.:

Part2

Page(from):

496

Page(to):

507

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421029 [0819421022]

Language:

English

Call no.:

P63600/2726

Type:

Conference Proceedings

Details

TDL ID:	ZA00020263
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1996 : 9th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1996.03.13-1996.03.15

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