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0.2-ｦﾌm lithography using i-line and alternating phase-shift mask

Author(s):
Publication title:
Optical Microlithography IX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2726
Pub. Year:
1996
Vol.:
Part2
Page(from):
453
Page(to):
460
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421029 [0819421022]
Language:
English
Call no.:
P63600/2726
Type:
Conference Proceedings

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