Migrating deep-UV lithography to the 0.25-ヲフm regime:issues and outlook
- Author(s):
Orvek,K.J. ( Digital Equipment Corp. ) Dass,S.K. Gruber,L. Dumford,S.A. Piasecki,M. Pollard,G.W. Fink,I.D. - Publication title:
- Optical Microlithography IX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2726
- Pub. Year:
- 1996
- Vol.:
- Part1
- Page(from):
- 398
- Page(to):
- 409
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- Language:
- English
- Call no.:
- P63600/2726
- Type:
- Conference Proceedings
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