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An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition

Author(s):
Publication title:
Trends and new applications of thin films : proceedings of the 6th International Symposium on Trends and New Applications of Thin Films (TATF '98), Regensburg, Germany, March 1998
Title of ser.:
Materials science forum
Ser. no.:
287-288
Pub. Year:
1998
Page(from):
319
Page(to):
322
Pub. info.:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878498154 [087849815X]
Language:
English
Call no.:
M23650
Type:
Conference Proceedings

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