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Post-etching polymer removal in sub-half-micron device technology

Author(s):
  • Chooi,S.Y.M. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Ismail,Z. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Ee,P.-Y. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Zhou,M.-S. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Publication title:
Multilevel Interconnect Technology II
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3508
Pub. Year:
1998
Page(from):
181
Page(to):
190
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429674 [0819429678]
Language:
English
Call no.:
P63600/3508
Type:
Conference Proceedings

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