Post-etching polymer removal in sub-half-micron device technology
- Author(s):
- Chooi,S.Y.M. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Ismail,Z. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Ee,P.-Y. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Zhou,M.-S. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
- Publication title:
- Multilevel Interconnect Technology II
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3508
- Pub. Year:
- 1998
- Page(from):
- 181
- Page(to):
- 190
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429674 [0819429678]
- Language:
- English
- Call no.:
- P63600/3508
- Type:
- Conference Proceedings
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