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Atomic scale control of epitaxial growth and interface in oxide thin films for advanced oxide lattice engineering

Author(s):
  • Yoshimoto, M. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Maeda, T. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Ohnishi, T. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Lee, G.H. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Koinuma, H. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
Publication title:
Epitaxial oxide thin films II : symposium held November 26-30, 1995, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
401
Pub. Year:
1996
Page(from):
21
Page(to):
31
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558993044 [1558993045]
Language:
English
Call no.:
M23500/401
Type:
Conference Proceedings

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