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Compact column design for a focused ion-beam lithography system

Author(s):
Publication title:
Charged particle optics IV : 22-23 July 1999, Denver, Colorado
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3777
Pub. Year:
1999
Page(from):
175
Page(to):
182
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432636 [0819432636]
Language:
English
Call no.:
P63600/3777
Type:
Conference Proceedings

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