Mesh-equipped Wehnelt source for SCALPEL
- Author(s):
- Katsap,V. ( Lucent Technologies/Bell Labs. )
- Waskiewicz,W.K.
- Rouse,J.A.
- Publication title:
- Charged particle optics IV : 22-23 July 1999, Denver, Colorado
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3777
- Pub. Year:
- 1999
- Page(from):
- 75
- Page(to):
- 81
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432636 [0819432636]
- Language:
- English
- Call no.:
- P63600/3777
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Design of a low-brightness highly uniform source for projection electron-beam lithography (SCALPEL)
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Quantitative aberration assessment by a through focal analysis of pattern edge sharpness
SPIE - The International Society for Optical Engineering |