Review of x-ray collimators for x-ray proximity lithography

Review of x-ray collimators for x-ray proximity lithography

Author(s):

Lane,S.M. ( Lawrence Livermore National Lab. )
Barbee,T.W.,Jr.
Mrowka,S.J.
Maldonado,J.R.

Publication title:

EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3767

Pub. Year:

1999

Page(from):

172

Page(to):

182

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819432537 [0819432539]

Language:

English

Call no.:

P63600/3767

Type:

Conference Proceedings

Details

TDL ID:	ZA00019935
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : EUV, x-ray, and neutron optics and sources
Conf. info. (Number):	1999
Conf. info. (Venue):	Denver, CO, USA
Conf. info. (Date):	1999.07.21-1999.07.23

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