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Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser

Author(s):
Bollanti,S ( ENEA Frascati )
Lazzaro,P.Di
Flora,F.
Letardi,T.
Marinai,A.
Nottola,A
Vigli-Papadaki,K.
Vitali,A
Bonfigli,F.
Lisi,N.
Palladino,L.
Reale,A.
Zheng,C.E.
8 more
Publication title:
EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3767
Pub. Year:
1999
Page(from):
33
Page(to):
44
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432537 [0819432539]
Language:
English
Call no.:
P63600/3767
Type:
Conference Proceedings

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